Join CDMC Visiting Executive Director Sarah Anne Carter in this conversation with Diné (Navajo) artist and scholar, Dakota Mace. A graduate of the University of Wisconsin–Madison and the Institute of American Indian Arts, Mace is a photographer and textile artist. Her art and research focuses on appropriation of Indigenous design-work. Mace is currently a lecturer in photography at UW–Madison and the photographer for the CDMC. Her work with the CDMC has also included piloting cultural appropriation workshops and co-curating Intersections: Indigenous Textiles of the Americas.

© 2020 by the Center for Design and Material Culture and the speaker.

This event is open to the public thanks to the support of The Anonymous Fund.

Follow Dakota Mace on Instagram: @dmaceart.

Please Note: CDMC website address in some PowerPoint slides is incorrect. It should read: "cdmc.wisc.edu."